Lithographic performance of thin dendritic polymer resists

A dendritic polymer resin lithographic resist is evaluated for surface and line edge roughness, and feasibility to enter the manufacturing environment . This novel resin demonstrates superb surface smoothness; linewidth variat ion is 5.1 Angstrom and surface roughness is 12.9 Angstrom. Most of the key concerns in the manufacturing environment are adequate, if not excellent. This resist shows excellent potential for precesses where very small and sm ooth features are required, such as gate level definition. (C) 2000 America n Vacuum Society. [S0734-211X(00)16806-4].