Influence of developer and development conditions on the behavior of high molecular weight electron beam resists

Authors
Hasko, DG Yasin, S Mumtaz, A
Citation
Dg. Hasko et al., Influence of developer and development conditions on the behavior of high molecular weight electron beam resists, J VAC SCI B, 18(6), 2000, pp. 3441-3444
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
6
Year of publication
2000
Pages
3441 - 3444
Database
ISI
SICI code
1071-1023(200011/12)18:6<3441:IODADC>2.0.ZU;2-1
Abstract
The nature of the developer and development conditions of high molecular we ight electron beam resists is known to influence sensitivity, contrast, lin e edge roughness, and ultimate resolution. These resist characteristics are explained using a dissolution model based on reptation theory and predicti ons are compared with experimental results on high molecular weight poly(me thylmethacrylate) developed in a range of solvent mixtures and conditions, including ultrasonically assisted development. (C) 2000 American Vacuum Soc iety. [S0734-211X(00)08806-5].