Combining advanced lithographic techniques and self-assembly of thin filmsof diblock copolymers to produce templates for nanofabrication

A technique to create templates for nanofabrication using thin films of dib lock copolymers is discussed and demonstrated. Advanced lithographic techni ques an used to create chemically patterned surfaces that manipulate the we tting behavior of diblock copolymer films and to guide the spatial micropha se separation of the block copolymer domains. Guided microphase separation has great potential for application of block copolymer films in nanofabrica tion because of perpendicular orientation of the domains to the substrate a nd macroscopic perfection in the ordering of copolymer domains. Lithography allows for registration of the domains with the substrate for creating add ressable arrays. Experimental implementation of the technique is demonstrat ed using extreme ultraviolet interferometric lithography, self-assembled mo nolayers of octadecyltrichlorosilane as imaging layers, and the self-assemb ly of films of symmetric poly(styrene-b-methyl methacrylate). (C) 2000 Amer ican Vacuum Society. [S0734-211X(00)00306-1].