Step and flash imprint lithography: Template surface treatment and defect analysis

We have finished the construction of an automated tool for step and flash i mprint lithography. The tool was constructed to allow defect studies by mak ing multiple imprints on a 200 mm wafer. The imprint templates for this stu dy were treated with a low surface energy, self-assembled monolayer to ensu re selective release at the template-etch barrier interface. This surface t reatment is very durable and survives repeated imprints and multiple aggres sive physical and chemical cleanings. The imprint and release forces were m easured for a number of successive imprints, and did not change significant ly. The process appears to be "self-cleaning." Contamination on the templat e is entrained in the polymerizing liquid, and the number of defects is red uced with repeated imprints. (C) 2000 American Vacuum Society. [S0734-211X( 00)16106-2].