High-resolution DLTS studies of vacancy-related defects in irradiated and in ion-implanted n-type silicon

Citation
Jh. Evans-freeman et al., High-resolution DLTS studies of vacancy-related defects in irradiated and in ion-implanted n-type silicon, MAT SC S PR, 3(4), 2000, pp. 237-241
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
ISSN journal
13698001 → ACNP
Volume
3
Issue
4
Year of publication
2000
Pages
237 - 241
Database
ISI
SICI code
1369-8001(200008)3:4<237:HDSOVD>2.0.ZU;2-H
Abstract
Using high-resolution Laplace deep-level transient spectroscopy (DLTS), we have compared the electron emission characteristics of vacancy-related defe cts in silicon. The samples include material irradiated with high-energy pr otons, material implanted with a heavy ion and silicon irradiated with 2 Me V electrons. We show that in the proton- and electron-irradiated material t he DLTS peak in the region of the (--/-) state of the divacancy at E-c = 0. 23 eV contains only one feature. The DLTS peak at 250 K which contains the signal derived from the (-/0) state of the divacancy is much larger in ion- implanted silicon than in electron-irradiated silicon. The Laplace DLTS is able to resolve clearly the (-/0) divacancy state and the V-P defect, where as conventional DLTS shows only a broad peak in that region. (C) 2000 Elsev ier Science Ltd. All rights reserved.