Silver (Ag) growth on H-terminated Si(001) surfaces with prepatterns of sil
icon (Si) dangling bonds has been studied at room temperature using a scann
ing tunneling microscope (STM). The patterns were fabricated by extraction
of hydrogen (H) atoms from a H-terminated Si(001)-(2X1) surface with a STM
tip. The study covers four different patterns: growth on H-terminated Si(00
1) surfaces with (1) an isolated single dangling bond site, (2) a dangling
bond wire (similar to 1 nm wide), (3) a dangling bond area (20x 20 nm(2)),
and (4) a dangling bond array. Ag adatoms readily diffuse on the surface an
d preferentially stick to patterns of dangling bonds. Ag adatoms are not sp
ontaneously substituted fur H atoms around the Ag adsorption sites. The beh
avior of Ag growth is different in each case. An isolated single dangling b
ond site can be occupied by an isolated single Ag atom or a Ag cluster. The
dangling bond wire is covered by an Ag island of 1 monolayer (ML) in heigh
t. On the dangling bond area, Ag atoms preferentially stick to the edge of
the area and a Ag island 1 ML, in height grows in the direction perpendicul
ar to the dimer rows. The behavior of each growth pattern is explained by t
he difference in binding energy of diffusing adatoms on H-terminated areas
and Si dangling bond sites.