Nanoscale growth of silver on prepatterned hydrogen-terminated Si(001) surfaces

Citation
M. Sakurai et al., Nanoscale growth of silver on prepatterned hydrogen-terminated Si(001) surfaces, PHYS REV B, 62(23), 2000, pp. 16167-16174
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
62
Issue
23
Year of publication
2000
Pages
16167 - 16174
Database
ISI
SICI code
0163-1829(200012)62:23<16167:NGOSOP>2.0.ZU;2-4
Abstract
Silver (Ag) growth on H-terminated Si(001) surfaces with prepatterns of sil icon (Si) dangling bonds has been studied at room temperature using a scann ing tunneling microscope (STM). The patterns were fabricated by extraction of hydrogen (H) atoms from a H-terminated Si(001)-(2X1) surface with a STM tip. The study covers four different patterns: growth on H-terminated Si(00 1) surfaces with (1) an isolated single dangling bond site, (2) a dangling bond wire (similar to 1 nm wide), (3) a dangling bond area (20x 20 nm(2)), and (4) a dangling bond array. Ag adatoms readily diffuse on the surface an d preferentially stick to patterns of dangling bonds. Ag adatoms are not sp ontaneously substituted fur H atoms around the Ag adsorption sites. The beh avior of Ag growth is different in each case. An isolated single dangling b ond site can be occupied by an isolated single Ag atom or a Ag cluster. The dangling bond wire is covered by an Ag island of 1 monolayer (ML) in heigh t. On the dangling bond area, Ag atoms preferentially stick to the edge of the area and a Ag island 1 ML, in height grows in the direction perpendicul ar to the dimer rows. The behavior of each growth pattern is explained by t he difference in binding energy of diffusing adatoms on H-terminated areas and Si dangling bond sites.