THICKNESS DEPENDENT PROPERTIES OF CHEMICALLY DEPOSITED BI2S3 THIN-FILMS

Citation
Cd. Lokhande et al., THICKNESS DEPENDENT PROPERTIES OF CHEMICALLY DEPOSITED BI2S3 THIN-FILMS, Thin solid films, 302(1-2), 1997, pp. 1-4
Citations number
10
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
302
Issue
1-2
Year of publication
1997
Pages
1 - 4
Database
ISI
SICI code
0040-6090(1997)302:1-2<1:TDPOCD>2.0.ZU;2-V
Abstract
Thin films of Bi2S3 with different thicknesses were prepared by the ch emical deposition method from an aqueous acidic bath using thiosulfate as a sulfide ion source. The effect of film thickness on the optical, structural and electrical properties was studied. A shift of 0.6 eV i n the optical bandgap energy, E-g, and a decrease in electrical resist ivity from 2.8 x 10(4) to 5 x 10(3) Ohm cm and an increase in grain si ze of Bi2S3 crystallites from 5.2 to 8.0 nm were observed when the thi ckness was varied from 52.7 to 220 nm. These changes are attributed to the quantum size effect in semiconducting films. (C) 1997 Elsevier Sc ience S.A.