ENERGY-BAND OFFSETS OF SIGEC HETEROJUNCTIONS

Citation
J. Kolodzey et al., ENERGY-BAND OFFSETS OF SIGEC HETEROJUNCTIONS, Thin solid films, 302(1-2), 1997, pp. 201-203
Citations number
10
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
302
Issue
1-2
Year of publication
1997
Pages
201 - 203
Database
ISI
SICI code
0040-6090(1997)302:1-2<201:EOOSH>2.0.ZU;2-#
Abstract
We report on conduction and valence band offsets in thick, relaxed Ge- rich Si1-x-yGexCy alloys grown by solid source molecular beam epitaxy on (100) Si substrates. X-ray photoemission spectroscopy was used to m easure the valence band energies with respect to atomic core levels, a nd showed that C increased the valence band maximum of SiGeC by +48 me V/%C. The bandgap energies were obtained from optical absorption, and were combined with the valence band offsets to yield the conduction ba nd offsets. For SiGeC/Si heterojunctions, the offsets were typically 0 .6 eV for the valence band and 0.38 eV for the conduction band, with a staggered type II alignment. These offsets can provide significant el ectron and hole confinement for device applications. (C) 1997 Elsevier Science S.A.