The effect of deposition temperature and Na gas partial pressure on the mor
phology, structure, composition and electrical properties of CN, thin films
was studied by HRTEM, EDS, STM and STS. Morphology ranging from homogeneou
s layers through spherical or cylindrical particles embedded into the Alms
to low density globular deposit of CN, was observed as a function of the ap
plied Nz gas pressure. The N-composition was found between 1-20% and the st
ructure varied from amorphous through fulleren-like to nanocrystalline diam
ond composed with amorphous CNx depending on the temperature and the plasma
parameters.