Amorphous carbon nitride films: Structure and electrical properties

The effect of deposition temperature and Na gas partial pressure on the mor phology, structure, composition and electrical properties of CN, thin films was studied by HRTEM, EDS, STM and STS. Morphology ranging from homogeneou s layers through spherical or cylindrical particles embedded into the Alms to low density globular deposit of CN, was observed as a function of the ap plied Nz gas pressure. The N-composition was found between 1-20% and the st ructure varied from amorphous through fulleren-like to nanocrystalline diam ond composed with amorphous CNx depending on the temperature and the plasma parameters.