Thermal dynamics of VO2 films within the metal-insulator transition: Evidence for chaos near percolation threshold

Citation
Lal. De Almeida et al., Thermal dynamics of VO2 films within the metal-insulator transition: Evidence for chaos near percolation threshold, APPL PHYS L, 77(26), 2000, pp. 4365-4367
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
26
Year of publication
2000
Pages
4365 - 4367
Database
ISI
SICI code
0003-6951(200012)77:26<4365:TDOVFW>2.0.ZU;2-R
Abstract
The thermal dynamics of thin vanadium dioxide films at the martensitic meta l-insulator phase transition has been evaluated experimentally by thermal e xcitation spectroscopy. Over the transition region, the device becomes high ly nonlinear, and its bolometric performance is affected. At low thermal cy cling rates for a temperature around the percolation threshold, the device stochastically switches into an unusual pattern. The originally smooth and monotonic shape of the R(T) curve for minor loops suddenly becomes unstable and unpredictable. By direct observation of at least two strange attractor s, the phenomenon clearly has been identified as chaotic. Bolometric perfor mance of VO2 based devices in the transition region may suffer strong degra dation for low thermal cycling rates. In this region, sensor responsivity f or periodic thermal excitation is significantly reduced. Resistance noise i s 1/f-type and self-generated oscillations were observed at frequency < 10( -2) Hz. (C) 2000 American Institute of Physics. [S0003- 6951(00)04752-5].