X-ray diffraction analysis of texture and stresses in carbon-doped chromium coatings produced by magnetron cathodic sputtering

Citation
C. Gautier-picard et al., X-ray diffraction analysis of texture and stresses in carbon-doped chromium coatings produced by magnetron cathodic sputtering, J PHYS IV, 10(P10), 2000, pp. 185-192
Citations number
11
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
10
Issue
P10
Year of publication
2000
Pages
185 - 192
Database
ISI
SICI code
1155-4339(200009)10:P10<185:XDAOTA>2.0.ZU;2-1
Abstract
Vapor deposited chromium doped carbon thin films are highly fiber textured and their major orientation depends on the growth parameters and in particu lar, on the substrate bias voltage. The strong texture does not allow to ap ply the well known sin(2)psi, - method stress determination technique using X-ray. Two methods will be used and compared : the Ideal Directions Method and the Single Crystal Stress Analysis. The growth parameters effect will be studied with different X-ray techniques. The fiber texture presents an i nclination in connection with the columnar morphology and the substrate pos ition according to the long target axis. The growth parameters such as the substrate bias voltage and the target power have a strong influence on the residual stress distribution.