The oxidation of materials is a longtime studied problem since its importan
t economic consequences. Nowadays, X-ray reflectometry is often used to car
acterise the structure of low-dimensioned systems. For this reason, we deve
lopped the application of X-ray reflectometry for the study of high tempera
ture oxidation. The evaluation of the possibilities and also the limits of
the application of these technique were studied. We show that X-ray reflect
ometry is well adapted to study thin films and so to investigate the high t
emperature oxidation. Surface roughness studies by diffuse X-ray reflectome
try and the description of it in terms of fractal theory allowed us to inve
stigate the morphology of oxidising surfaces. To validate this description
we performed comparative studies using an atomic force microscopy. The frac
tal model could be validated in the most cases. We have shown that this tec
hnique is a promising tool for the study of the oxidation in its initial ph
ase.