Thickness of thin films measurable by X-ray fluorescence during monochromatic excitation

Authors
Broll, N Zeh, E Bach, M
Citation
N. Broll et al., Thickness of thin films measurable by X-ray fluorescence during monochromatic excitation, J PHYS IV, 10(P10), 2000, pp. 333-341
Citations number
2
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
10
Issue
P10
Year of publication
2000
Pages
333 - 341
Database
ISI
SICI code
1155-4339(200009)10:P10<333:TOTFMB>2.0.ZU;2-#
Abstract
In some favourable cases, X-my fluorescence can be used as surface characte rization method in particular for thickness measurement of thin films in th e range down to a few 0.1 nanometers. Using a quasi-monochromatic excitatio n, we show the lower and upper detection limits. We present the results obt ained for a gold layer on a silicium substrate.