Strain state in GaN epilayers from optical experiments

Citation
E. Deleporte et al., Strain state in GaN epilayers from optical experiments, J APPL PHYS, 89(2), 2001, pp. 1116-1119
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
2
Year of publication
2001
Pages
1116 - 1119
Database
ISI
SICI code
0021-8979(20010115)89:2<1116:SSIGEF>2.0.ZU;2-D
Abstract
The intrinsic optical properties of GaN thin epilayers grown on a sapphire substrate and by Mg-enhanced lateral overgrowth (ELO) are studied as a func tion of temperature (from 20 up to 250 K) by means of photoluminescence exc itation spectroscopy. The comparison between the experimental and calculate d results allows us to determine the strain state of the GaN layers. At low temperature (T=20 K) the strain is stronger in the ELO epilayers than in t he GaN layers grown on sapphire, but, contrary to the GaN layers grown on t he sapphire substrate, the strain state remains constant in the overgrown G aN layers when temperature varies. (C) 2001 American Institute of Physics.