Spectroscopic identification of light emitted from defects in silicon devices

Citation
Ms. Rasras et al., Spectroscopic identification of light emitted from defects in silicon devices, J APPL PHYS, 89(1), 2001, pp. 249-258
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
1
Year of publication
2001
Pages
249 - 258
Database
ISI
SICI code
0021-8979(20010101)89:1<249:SIOLEF>2.0.ZU;2-Y
Abstract
A comprehensive study of different fundamental aspects of light emission fr om defects in Si semiconductor devices is presented. Based on an experiment al analysis, using a new highly sensitive spectroscopic photon emission mic roscope (SPEM) for continuous wavelength analysis (2.5 eV-1.2 eV), a unique assignment of the spectrum of the emitted light and the corresponding fail ure mechanism is established. Three distinguishable basic spectral categori es were identified. They were attributed to gate oxide breakdown, metal sho rts, and electro-static discharge caused junction spiking. The focused ion beam technique was used to look at the damage sites for confirmation of the SPEM results. (C) 2001 American Institute of Physics.