Nonlinear electrical transport in nc-Si/CaF2 multilayer structures with ultrathin CaF2 layers

Citation
V. Ioannou-sougleridis et al., Nonlinear electrical transport in nc-Si/CaF2 multilayer structures with ultrathin CaF2 layers, J APPL PHYS, 89(1), 2001, pp. 610-614
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
1
Year of publication
2001
Pages
610 - 614
Database
ISI
SICI code
0021-8979(20010101)89:1<610:NETINM>2.0.ZU;2-2
Abstract
We present a study of the electrical transport in (Si/CaF2)(n) superlattice s with n = 100 and with Si, CaF2 thickness in each period in the range of 1 .2-1.6 nm (Si) and below 1 nm (CaF2), respectively. The results suggest tha t at gate voltages higher than +/-4 V a Poole-Frenkel-type mechanism accoun ts for the observed electric-field-assisted conduction through the layers. (C) 2001 American Institute of Physics.