Hr. Reinhoudt et al., Characterization of the active phase in NiW/gamma-Al2O3 catalysts in various stages of sulfidation with FTIR(NO) and XPS, J CATALYSIS, 196(2), 2000, pp. 315-329
The sulfidation of oxidic mixed metal catalysts is an important step in the
activation of these catalyst precursors for hydrotreating reactions. The s
ulfidation of NiW/gamma -Al2O3 catalysts is especially interesting since it
is possible to study intermediate stages of sulfidation as separate, stabl
e phases. By carrying out a systematic study, a detailed picture was obtain
ed of the sulfiding reactions and the species formed. The major techniques
used were FTIR(NO) and semiquantitative quasi in situ XPS. A reference cata
lyst was obtained by extraction of Ni from the oxidic catalysts. Four types
of Ni are present in the oxidic NiW/gamma -Al2O3 catalysts, viz., Ni in a
surface aluminate, Ni in a mixed oxide with W,Ni in a mixed oxide with W an
d Al, and bulk Ni aluminate. No separate Ni oxide phase is present. It was
found that even in dried NiW/gamma -Al2O3 catalysts, a significant part of
Ni strongly interacts with either W or the support and is present in subsur
face positions. This subsurface Ni species migrates to the surface upon sul
fidation below 373 K. Sulfidation below 473 K shows the development of a Ni
sulfide species, which is in close interaction with an oxidic or partially
sulfided W6+ phase. In addition, part of the W phase can be sulfided at lo
w temperature to form WS3 and it was established that no W4+ species are fo
rmed below 600 K. XPS indicated that sulfidation above 600 K results in a d
istinct change in the chemical environment of Ni ions, which was assigned t
o the formation of the so-called NiWS phase. Remarkably, FTIR(NO) showed th
at after sulfidation above 700 K, the gas-phase-exposed W4+ sites become la
rgely inaccessible for NO. This is interpreted as a full decoration of WS2
edges, probably with Ni sulfide, which occurs at a significantly higher tem
perature than the initial formation of NiWS. (C) 2000 Academic Press.