Image quality improvement using helium gas in low voltage variable pressure scanning electron microscopy

Citation
E. Oho et al., Image quality improvement using helium gas in low voltage variable pressure scanning electron microscopy, J ELEC MICR, 49(6), 2000, pp. 761-763
Citations number
9
Categorie Soggetti
Multidisciplinary
Journal title
JOURNAL OF ELECTRON MICROSCOPY
ISSN journal
00220744 → ACNP
Volume
49
Issue
6
Year of publication
2000
Pages
761 - 763
Database
ISI
SICI code
0022-0744(2000)49:6<761:IQIUHG>2.0.ZU;2-6
Abstract
An effective combination of the low voltage and variable pressure (VP) scan ning electron microscopy (SEM) are discussed. In low voltage VP-SEM, helium gas is utilized for reducing the amount of scatter of the primary electron beam. Most samples can receive various benefits obtained from the combinat ion of low voltage and low vacuum observation. Compared to a back-scattered electron (BSE) image in air, signal-to-noise ratio (SNR) of a BSE image ta ken with helium gas is 5.4 times under a pressure of 50 Pa and an accelerat ing voltage of 1.5 kV.