In this paper we report on the growth of La0.67Sr0.33MnO3 colossal magnetor
esistance thin films by using RF reactive sputtering techniques onto therma
lly oxidized Si wafers. The as-prepared films show no magnetoresistance cha
nge at room temperature but annealed films, with nanocrystalline structures
, display a magnetoresistance of similar to 0.4% and similar to 2.2% at 500
Oe and 5 kOe respectively, quite attractive from a technological point of
view. This low-field magnetoresistance is related to the magnetization proc
ess and dominated by transport across grain boundaries. (C) 2000 Elsevier S
cience B.V. All rights reserved.