The alloy concentration as a control parameter of the electron capture mechanism

Authors
Stavrou, VN
Citation
Vn. Stavrou, The alloy concentration as a control parameter of the electron capture mechanism, J PHYS-COND, 12(50), 2000, pp. 10535-10542
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS-CONDENSED MATTER
ISSN journal
09538984 → ACNP
Volume
12
Issue
50
Year of publication
2000
Pages
10535 - 10542
Database
ISI
SICI code
0953-8984(200012)12:50<10535:TACAAC>2.0.ZU;2-5
Abstract
We present the electron capture rates for the double heterostructure GaAs/A lxGa1-xAs confined between two outer metallic barriers. The capture mechani sm is assisted by the emission of bulk and dielectric continuum (DC) phonon s. The alloys generate other phonon resonances compared with the electron c apture rates, which are evaluated in the case of the GaAs/AlAs heterostruct ure. This investigation shows that the concentration of aluminium is an imp ortant parameter to control the electron capture mechanism.