Dislocations in semiconductors can be strongly affected by a hydrogen plasm
a; core states may be passivated and mobility changed. For example, in sili
con the activation barrier For dislocation motion drops by 1.0 eV upon expo
sure to H plasma for one hour at 470-540 degreesC. If such an effect were t
o be found in diamond, a simple scaling argument would yield an activation
energy of 1.9 eV. Here, density functional calculations have been applied t
o the 90 degrees partial dislocation in diamond which confirm this predicti
on. They also show that, energetically, the soliton model for motion of the
90 degrees partial is as viable as the strained-bond model.