Plasma diagnostics in industry

Plasma processing forms an invaluable part of semiconductor device manufact uring. For the most part, commercial tools have relied on an empirical proc ess for their evolution and relied exclusively on plasma characterization o nly at the development stage. As this industry advances there is the need t o provide non-invasive plasma characterization and diagnostics on the proce ssing equipment, in order to provide more control over the plasma propertie s. We outline some of the typical configurations used in the industry and d escribe two of the measurement techniques we have developed for the charact erization of these industrial plasma sources.