An improved automated anodization apparatus for fabricating nanostructure devices and porous silicon

Authors
Garman, C Sines, P McGinnis, SP Das, B
Citation
C. Garman et al., An improved automated anodization apparatus for fabricating nanostructure devices and porous silicon, REV SCI INS, 72(1), 2001, pp. 275-277
Citations number
3
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
REVIEW OF SCIENTIFIC INSTRUMENTS
ISSN journal
00346748 → ACNP
Volume
72
Issue
1
Year of publication
2001
Part
1
Pages
275 - 277
Database
ISI
SICI code
0034-6748(200101)72:1<275:AIAAAF>2.0.ZU;2-8
Abstract
This note describes an improved anodization apparatus that provides enhance d safety and efficiency, and is suitable for large-scale volume production. The improved anodization apparatus also provides increased electrolyte tem perature control, and allows flexibility in the size and shape of the subst rate. Overall, this equipment will find wide applications in the fabricatio n of template-based semiconductor nanostructures, porous silicon, and other devices that require electrochemical processing. (C) 2001 American Institu te of Physics.