SIMULATIONAL STUDIES OF ENERGY DEPOSITION AND SECONDARY PROCESSES IN DEEP X-RAY-LITHOGRAPHY

The effect of secondary radiative processes on the energy deposition p atterns in x-ray deep lithography (the first step in the LiGA processe s) is investigated via computer simulations. Fluorescence photon and p hoto- and Auger-electron production in the mask membrane, absorber, re sist and substrate are simulated via classical trajectory, Monte Carte techniques. Comparisons of the simulated dose distribution with and w ithout secondary radiative processes show that these processes lead to significant delocalization of the deposited energy, which in turn deg rades the developed structure. In addition, an upper limit on the ener gy spreading effect of higher-order processes is determined. From the calculations presented here, it is clear that the main limiting factor in obtaining a more precise prediction of microstructure shapes is an understanding of the chemical processes in the development step of th e LiGA processes.