Properties and durability of thin a-C : H overcoats produced by plasma enhanced chemical vapor deposition

Citation
Ml. Wu et al., Properties and durability of thin a-C : H overcoats produced by plasma enhanced chemical vapor deposition, THIN SOL FI, 377, 2000, pp. 249-253
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
377
Year of publication
2000
Pages
249 - 253
Database
ISI
SICI code
0040-6090(200012)377:<249:PADOTA>2.0.ZU;2-5
Abstract
Radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) techni que was used to deposit thin amorphous hydrogenated carbon (a-C:H) overcoat s on glass ceramic disc substrates. Raman spectroscopy results showed that higher sp(3) carbon content films can be obtained by applying appropriate k inetic energy of ion bombardment (similar to 100 eV) during film growth. Ho wever, a higher content of hydrogen was also observed in such films. The re sults suggest that a certain fraction of sp(3) carbon bonds is likely to be terminated by hydrogen and become dangling bonds. These dangling bonds may be important to the durability performance in the tribe-contact interface. The highly hydrogenated carbon overcoats (similar to 40 at.%) showed signi ficant improvement in tribological performance compared with the less hydro genated films. The contact-start-stop test at ambient environment of such o vercoats showed good durability over 10 K cycles at the him thickness of 3. 6 nm. (C) 2000 Elsevier Science B.V. All rights reserved.