Electron tunneling and noise studies in ferromagnetic junctions

Citation
Er. Nowak et al., Electron tunneling and noise studies in ferromagnetic junctions, THIN SOL FI, 377, 2000, pp. 699-704
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
377
Year of publication
2000
Pages
699 - 704
Database
ISI
SICI code
0040-6090(200012)377:<699:ETANSI>2.0.ZU;2-Y
Abstract
Transport properties of exchange-biased magnetic tunnel junction structures are reported as a function of tunnel barrier thickness. The temperature de pendence of the tunneling conductance and magnetoresistance (MR) is consist ent with recent theories relating it to the magnon excitations at the elect rode-barrier interface or the temperature-dependent surface magnetization. We have also measured the bias voltage dependence of the MR. For CoFe magne tic electrodes, the reduction in MR is approximately 50% at biases of simil ar to 250 mV. At low temperatures, we observe a cusp-like dip in the tunnel ing conductance at zero-bias. The conductance increases as the square-root of the bias voltage, indicating that electron-electron interactions as in d isordered media may be important. Coating a magnetic electrode or the oxide barrier with an alternate, thin magnetic layer of higher spin polarization is shown to generally increase the MR by several percent but at the expens e of higher 1/f noise. (C) 2000 Elsevier Science B.V. All rights reserved.