Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes

Citation
El. Crane et al., Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes, ACC CHEM RE, 33(12), 2000, pp. 869-877
Citations number
65
Categorie Soggetti
Chemistry & Analysis",Chemistry
Journal title
ACCOUNTS OF CHEMICAL RESEARCH
ISSN journal
00014842 → ACNP
Volume
33
Issue
12
Year of publication
2000
Pages
869 - 877
Database
ISI
SICI code
0001-4842(200012)33:12<869:AFATMO>2.0.ZU;2-D
Abstract
In this Account, we present several representative studies of thin-film gro wth by chemical vapor deposition, with particular emphasis given to elucida ting the mechanistic, energetic, and structural aspects of nucleation and g rowth. These understandings have allowed us to develop new methods to depos it patterned, as opposed to blanket, thin films. We show how such procedure s can be exploited to effect the directed assembly (i.e., the additive fabr ication) of a device architecture.