Quasimetallic silicon micromachined photonic crystals

Citation
B. Temelkuran et al., Quasimetallic silicon micromachined photonic crystals, APPL PHYS L, 78(3), 2001, pp. 264-266
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
3
Year of publication
2001
Pages
264 - 266
Database
ISI
SICI code
0003-6951(20010115)78:3<264:QSMPC>2.0.ZU;2-0
Abstract
We report on fabrication of a layer-by-layer photonic crystal using highly doped silicon wafers processed by semiconductor micromachining techniques. The crystals, built using (100) silicon wafers, resulted in an upper stop b and edge at 100 GHz. The transmission and defect characteristics of these s tructures were found to be analogous to metallic photonic crystals. We also investigated the effect of doping concentration on the defect characterist ics. The experimental results agree well with predictions of the transfer m atrix method simulations. (C) 2001 American Institute of Physics.