Evolution of deep centers in GaN grown by hydride vapor phase epitaxy

Citation
Zq. Fang et al., Evolution of deep centers in GaN grown by hydride vapor phase epitaxy, APPL PHYS L, 78(3), 2001, pp. 332-334
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
3
Year of publication
2001
Pages
332 - 334
Database
ISI
SICI code
0003-6951(20010115)78:3<332:EODCIG>2.0.ZU;2-1
Abstract
Deep centers and dislocation densities in undoped n GaN, grown by hydride v apor phase epitaxy (HVPE), were characterized as a function of the layer th ickness by deep level transient spectroscopy and transmission electron micr oscopy, respectively. As the layer thickness decreases, the variety and con centration of deep centers increase, in conjunction with the increase of di slocation density. Based on comparison with electron-irradiation induced ce nters, some dominant centers in HVPE GaN are identified as possible point d efects. (C) 2001 American Institute of Physics.