A theoretical approach to the drying process of thin film layers

Citation
A. Avci et al., A theoretical approach to the drying process of thin film layers, APPL TH ENG, 21(4), 2001, pp. 465-479
Citations number
14
Categorie Soggetti
Mechanical Engineering
Journal title
APPLIED THERMAL ENGINEERING
ISSN journal
13594311 → ACNP
Volume
21
Issue
4
Year of publication
2001
Pages
465 - 479
Database
ISI
SICI code
1359-4311(200103)21:4<465:ATATTD>2.0.ZU;2-N
Abstract
In this study, the process of drying of thin films on a continuously moving flat plate which occurs in ink and coating solvents is examined theoretica lly. For simplicity, it is assumed that during the drying period the solven t has porous media and on the drying surface the vapour pressure of the eva porating liquid remains at a quasi-saturated value corresponding to the tem perature of the liquid. Under these assumptions, two relationships which gi ve the time rate of both the solvent temperature and the drying rate are ob tained, depending on the drying air, surface, and solvent properties. The t heoretical results are compared with some experimental data and found to be satisfactory particularly for the total drying time. (C) 2000 Elsevier Sci ence Ltd. All rights reserved.