Film wiping in the molecular evaporator

Citation
J. Cvengros et al., Film wiping in the molecular evaporator, CHEM ENGN J, 81(1-3), 2001, pp. 9-14
Citations number
11
Categorie Soggetti
Chemical Engineering
Journal title
CHEMICAL ENGINEERING JOURNAL
ISSN journal
13858947 → ACNP
Volume
81
Issue
1-3
Year of publication
2001
Pages
9 - 14
Database
ISI
SICI code
1385-8947(20010101)81:1-3<9:FWITME>2.0.ZU;2-O
Abstract
This study deals with a wiper for a molecular evaporator. Its wiping elemen t has the shape of a cylinder with a screw thread with coarse pitch (lead) on its surface. The wiping element bears on the evaporating cylinder due to centrifugal force and rolls over it, bringing the liquid on the evaporatin g cylinder into an intensive complex movement. The screw thread on the wipi ng element surface increases the permeability of the liquid through the ele ment, while restricting the formation of a longitudinal wave which develops in front of the element. An analysis of residence time distribution curves shows that there are three different liquid how regimes on the evaporating cylinder. In this study, conditions of the formation of these regimes and their consequences are discussed. Optimum conditions for distillation can b e reached at peripheral speeds of the wiper at which increased retention of a liquid on the evaporator occurs. This leads to an increased residence ti me. The increased residence time is a positive factor which makes efficient evaporation under gentle conditions at a lower evaporating temperature pos sible. (C) 2001 Elsevier Science B.V. All rights reserved.