Hydrogen impermeability of TiN films and its dependence on nitrogen concentration at high temperatures

Citation
T. Nishikiori et al., Hydrogen impermeability of TiN films and its dependence on nitrogen concentration at high temperatures, J ELCHEM SO, 148(1), 2001, pp. E52-E59
Citations number
42
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
1
Year of publication
2001
Pages
E52 - E59
Database
ISI
SICI code
0013-4651(200101)148:1<E52:HIOTFA>2.0.ZU;2-2
Abstract
The hydrogen impermeability of titanium nitride films and its dependence on nitrogen concentration have been estimated by molten salt electrochemical techniques at 723 K. Surface nitriding of titanium substrates was conducted by two methods, i.e., gas nitriding and molten salt electrochemical nitrid ing. Hydrogen concentration in the titanium nitride films was directly meas ured by elastic recoil detection (ERD) analysis, it was confirmed that the titanium nitride film worked as a hydrogen permeation barrier at high tempe ratures. When titanium coexisted with titanium nitrides, the hydrogen imper meability decreased with the increase of the volume concentration of titani um, which worked as the hydrogen-diffusing medium. (C) 2000 The Electrochem ical Society. S0013-3651(00)07-04 1-5. All rights reserved.