T. Nishikiori et al., Hydrogen impermeability of TiN films and its dependence on nitrogen concentration at high temperatures, J ELCHEM SO, 148(1), 2001, pp. E52-E59
The hydrogen impermeability of titanium nitride films and its dependence on
nitrogen concentration have been estimated by molten salt electrochemical
techniques at 723 K. Surface nitriding of titanium substrates was conducted
by two methods, i.e., gas nitriding and molten salt electrochemical nitrid
ing. Hydrogen concentration in the titanium nitride films was directly meas
ured by elastic recoil detection (ERD) analysis, it was confirmed that the
titanium nitride film worked as a hydrogen permeation barrier at high tempe
ratures. When titanium coexisted with titanium nitrides, the hydrogen imper
meability decreased with the increase of the volume concentration of titani
um, which worked as the hydrogen-diffusing medium. (C) 2000 The Electrochem
ical Society. S0013-3651(00)07-04 1-5. All rights reserved.