Scaling of x-ray emission and ion velocity in laser produced Cu plasmas

Citation
Ybsr. Prasad et al., Scaling of x-ray emission and ion velocity in laser produced Cu plasmas, PRAMANA-J P, 55(5-6), 2000, pp. 797-802
Citations number
7
Categorie Soggetti
Physics
Journal title
PRAMANA-JOURNAL OF PHYSICS
ISSN journal
03044289 → ACNP
Volume
55
Issue
5-6
Year of publication
2000
Pages
797 - 802
Database
ISI
SICI code
0304-4289(200011/12)55:5-6<797:SOXEAI>2.0.ZU;2-O
Abstract
The x-ray emission from slab targets of copper irradiated by Nd:glass laser (1.054 mum, 5 and 15 ns) at intensities between 10(12) and 10(14)W/cm(2) h as been studied. The x-ray emissions were monitored with the help of high q uantum efficiency x-ray silicon photo diodes and vacuum photo diodes, all c overed with aluminium filters of different thickness. The x-ray intensity v s the laser intensity has a scaling factor of (1.2-1.92). The relative x-ra y conversion efficiency follows an empirical relationship which is in close agreement with the one reported by Babonneau et al. The ion velocities wer e monitored using Langmuir probes placed at different angles and radial dis tances from the target position. The variation of the ion velocity with the laser intensity follows a scaling of the form Phi (beta) where beta simila r to 0.22 which is in good agreement with the reported scaling factor value s. The results on the x-ray emission from Cu plasma are reported.