Sheath and plasma parameters in a magnetized plasma system

Citation
B. Singha et al., Sheath and plasma parameters in a magnetized plasma system, PRAMANA-J P, 55(5-6), 2000, pp. 899-910
Citations number
11
Categorie Soggetti
Physics
Journal title
PRAMANA-JOURNAL OF PHYSICS
ISSN journal
03044289 → ACNP
Volume
55
Issue
5-6
Year of publication
2000
Pages
899 - 910
Database
ISI
SICI code
0304-4289(200011/12)55:5-6<899:SAPPIA>2.0.ZU;2-H
Abstract
The variation of electron temperature and plasma density in a magnetized Nz plasma is studied experimentally in presence of a grid placed at the middl e of the system. Plasma leaks through the negatively biased grid from the s ource region into the diffused region. It is observed that the electron tem perature increases with the magnetic field in the diffused region whereas i t decreases in the source region of the system for a constant grid biasing voltage. Also, investigation is done to see the change of electron temperat ure with grid biasing voltage for a constant magnetic field. This is accomp anied by the study of the variation of sheath structure across the grid for different magnetic field and grid biasing voltage as well. It reveals that with increasing magnetic field and negative grid biasing voltage, the shea th thickness expands.