Performance of p-type silicon-oxide windows in amorphous silicon solar cell

Citation
Y. Matsumoto et al., Performance of p-type silicon-oxide windows in amorphous silicon solar cell, SOL EN MAT, 66(1-4), 2001, pp. 163-170
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
SOLAR ENERGY MATERIALS AND SOLAR CELLS
ISSN journal
09270248 → ACNP
Volume
66
Issue
1-4
Year of publication
2001
Pages
163 - 170
Database
ISI
SICI code
0927-0248(200102)66:1-4<163:POPSWI>2.0.ZU;2-C
Abstract
a-SiOx films have been prepared using silane and pure oxygen as reactive ga ses in plasma CVD system. Diborane was introduced as a doping gas to obtain p-type conduction silicon oxide. Infrared absorption spectra show the inco rporation of Si-O stretch mode around 1000 cm(-1). The optical bandgap incr eases with the oxygen to silane gas ratio, while the electrical conductivit y decreases. Hydrogenated amorphous silicon solar cells have been fabricate d using p-type a-SiOx with around 1.85 eV optical bandgap and conductivity greater than 10(-7) S/cm, The measured current-voltage characteristics of t he solar cells under 100 mW/cm(2) artificial light are V-oc = 0.84 V, J(sc) = 14.7 mA/cm(2), FF = 0.635 with a conversion efficiency of 7.84%. (C) 200 1 Elsevier Science B.V. All rights reserved.