Microcrystalline n-i-p solar cells deposited at 10 angstrom/s by VHF-GD

Citation
L. Feitknecht et al., Microcrystalline n-i-p solar cells deposited at 10 angstrom/s by VHF-GD, SOL EN MAT, 66(1-4), 2001, pp. 397-403
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
SOLAR ENERGY MATERIALS AND SOLAR CELLS
ISSN journal
09270248 → ACNP
Volume
66
Issue
1-4
Year of publication
2001
Pages
397 - 403
Database
ISI
SICI code
0927-0248(200102)66:1-4<397:MNSCDA>2.0.ZU;2-H
Abstract
In the present paper, we report on thin-film microcrystalline silicon solar cells grown at high deposition rates on back-reflectors with optimised lig ht-scattering capabilities. A single-junction solar cell with a conversion efficiency of eta = 7.8% (2 mum thickness) was fabricated at a deposition r ate of 7.4 Angstrom /s. Another microcrystalline cell was successfully impl emented in a 'micromorph" tandem (i.e. a microcrystalline/amorphous tandem cell with n-i-p-n-i-p configuration); the resulting initial conversion effi ciency was eta = 11.2%. A 4 mum thick single-junction cell at a deposition rate of 10 Angstrom /s and with a conversion efficiency of eta = 6.9% was f abricated on a non-optimised substrate. Special attention is drawn to near- infrared spectral response and interface optimisation. (C) 2001 Elsevier Sc ience B.V. All rights reserved.