Y. Ziegler et al., More stable low gap a-Si : H layers deposited by PE-CVD at moderately hightemperature with hydrogen dilution, SOL EN MAT, 66(1-4), 2001, pp. 413-419
In the present work, several series with variation of deposition parameters
such as hydrogen dilution ratio, VHF-power and plasma excitation frequency
f(exc) have been extensively analyzed. Compared with "conventional" more-s
table layers obtained at 200-250 degreesC and high H-2 dilution ratios of a
bout 10, it was observed that electrical transport properties after light-i
nduced degradation of layers deposited at "moderately high" temperatures (3
00-350 degreesC) are equivalent but required lower H-2 dilution ratios (bet
ween 2 and 4). As a consequence, the deposition rate of more stable layers
obtained at moderately high temperatures is increased by a factor of 2. Mor
eover, optical gaps of a-Si:H deposited at 300-350 degreesC are significant
ly lower (by approx. 10 meV); furthermore, they decrease with f(exc). (C) 2
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