PZT thin films with preferred-orientation induced by external stress

The microstructure of oriented Pb(Zr0.7Ti0.3)O-3 thin films prepared via th e sol-gel method has been carefully investigated. After the precursor was h eated, the resultant thin film displayed (100)-preferred orientation becaus e of accumulation of the colloidal particles. X-Ray diffraction (XRD) resul t indicated that the strong [100]- or [111]-preferred orientation of the PZ T thin films could be observed when the substrates slightly bend under appr opriate external stresses during annealing procedure. Atomic force microsco pe (AFM) images revealed that (100)-oriented grains aggregated in some sepa rate zones. The above results can be well explained in the view of internal stress during crystallization. (C) 2000 Elsevier Science B.V. All rights r eserved.