Measurement in situ of thickness and optical properties of transparent films by optical spectrometry

Citation
F. Perry et al., Measurement in situ of thickness and optical properties of transparent films by optical spectrometry, VIDE, 55(297), 2000, pp. 286
Citations number
3
Categorie Soggetti
Material Science & Engineering
Journal title
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
ISSN journal
12660167 → ACNP
Volume
55
Issue
297
Year of publication
2000
Database
ISI
SICI code
1266-0167(2000)55:297<286:MISOTA>2.0.ZU;2-G
Abstract
Optical emission spectroscopy is a commonly used technique for controlling the reactive sputtering process which however doesn't allow the in situ det ermination of the critical reactive gas flow rate for high rate deposition of stoichiometrie ceramic coatings. We present here a method consisting in exploiting the transmission interferometric phenomena occurring during the growth of a transparent film on a transparent substrate. This method allows both the in situ determination of the critical reactive gas flow rate for high rate deposition of stoichiometric films and the in situ or ex situ det ermination of the thickness and of the Optical indexes of the deposited fil m.