Micrometer patterning using synchrotron radiation and the polyaniline-PVC blend

Authors
Carinhana, D De Paoli, MA de Castro, CSC de Souza, GGB
Citation
D. Carinhana et al., Micrometer patterning using synchrotron radiation and the polyaniline-PVC blend, ADV MAT OPT, 10(6), 2000, pp. 241-244
Citations number
18
Categorie Soggetti
Material Science & Engineering
Journal title
ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS
ISSN journal
10579257 → ACNP
Volume
10
Issue
6
Year of publication
2000
Pages
241 - 244
Database
ISI
SICI code
1057-9257(200011/12)10:6<241:MPUSRA>2.0.ZU;2-Q
Abstract
In the present work we investigated the localized photodoping process of po lyaniline-emeraldine base/poly(vinylchloride) blends by high-energy photons from a synchrotron source. The doped blend was characterized using optical and electrical parameters. An abrupt increase of conductivity by four orde rs of magnitude (10(-10) to 10(-6) Scm(-1)) was observed using an initial d ose of 500 Jcm(-3). Lithographic patterns were recorded with micrometer res olution, Copyright (C) 2000 John Wiley & Sons, Ltd.