Oxidation kinetics in SrTiO3 homoepitaxy on SrTiO3(001)

Citation
Xd. Zhu et al., Oxidation kinetics in SrTiO3 homoepitaxy on SrTiO3(001), APPL PHYS L, 78(4), 2001, pp. 460-462
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
4
Year of publication
2001
Pages
460 - 462
Database
ISI
SICI code
0003-6951(20010122)78:4<460:OKISHO>2.0.ZU;2-0
Abstract
Using an oblique-incidence optical reflectivity difference technique, we in vestigated kinetic processes in SrTiO3 homoepitaxy on SrTiO3(001) under pul sed-laser deposition conditions. Depending upon growth temperature and oxyg en ambient pressure, we found that the oxidation of an as-grown SrTiO3 mono layer may take a much longer time to complete than the recrystallization of the monolayer. The oxidation reaction was found to be characterized by an effective activation energy barrier of 1.35 eV and a large preexponential f actor. (C) 2001 American Institute of Physics.