Thermally stimulated current method applied on diodes with high concentration of deep trapping levels

Citation
I. Pintilie et al., Thermally stimulated current method applied on diodes with high concentration of deep trapping levels, APPL PHYS L, 78(4), 2001, pp. 550-552
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
4
Year of publication
2001
Pages
550 - 552
Database
ISI
SICI code
0003-6951(20010122)78:4<550:TSCMAO>2.0.ZU;2-4
Abstract
We propose an improved method of thermally stimulated currents (TSC) spectr a analysis in the case of diodes having a concentration of traps higher tha n that of doping impurities. Beside the calculation of trap concentrations from TSC peaks analysis, the method allows us to evaluate the density and t he type of the very deep trapping level which, due to the contribution of l eakage current, can not be detected in a real TSC experiment. The proposed method is applied to a p(+)-n Silicon diode irradiated with 1.82x10(13)neut rons/cm(2). (C) 2001 American Institute of Physics.