IR laser-induced decomposition of hexamethyldisiloxane for chemical vapourdeposition of nano-structured hydrido(methyl)silicone powders

Authors
Kupcik, J Bastl, Z Subrt, J Pola, J Papadimitriou, VC Prosmitis, AV Papagiannakopoulos, P
Citation
J. Kupcik et al., IR laser-induced decomposition of hexamethyldisiloxane for chemical vapourdeposition of nano-structured hydrido(methyl)silicone powders, J AN AP PYR, 57(1), 2001, pp. 109-118
Citations number
16
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ANALYTICAL AND APPLIED PYROLYSIS
ISSN journal
01652370 → ACNP
Volume
57
Issue
1
Year of publication
2001
Pages
109 - 118
Database
ISI
SICI code
0165-2370(200101)57:1<109:ILDOHF>2.0.ZU;2-1
Abstract
The infrared laser-induced decomposition of hexamethyldisiloxane with high- fluence laser pulses affords gaseous C-1-C-2 hydrocarbons, dimethylsilane a nd trimethylsilane, all of which confirm a multitude of decomposition steps involving cleavage of the strong Si-O bond. The process carried out in the absence or presence of hydrogen affords chemical vapour deposition of soli d nano-structured hydrido(methyl)silicone powders and represents the first thermal access to these materials from peralkylated siloxane precursor. (C) 2001 Elsevier Science B.V. All rights reserved.