The microstructures of three different silicon carbide (SiC) fibres produce
d by CVD (chemical vapour deposition) have been examined in detail using Ra
man microscopy. Raman spectra were mapped out across the entire cross-secti
ons of these silicon carbide fibres using an automated x-y stage with a spa
tial resolution of 1 mum. The Raman maps clearly illustrate the variations
in microstructure in such types of silicon carbide fibres. It appears that
the SCS-type fibres contain carbon as well as SiC whereas the Sigma 1140+ f
ibre also contains free silicon. Furthermore, the differences in the detail
ed structures of the carbon and silicon carbide present in the fibres can a
lso be investigated. Raman microscopy is demonstrated to be a very sensitiv
e technique for characterising the composition and microstructure of CVD si
licon carbide fibres prepared using different processing conditions. (C) 20
01 Kluwer Academic Publishers.