Chemical and physical sputtering of aluminium and gold samples using Ar-H-2 DC-glow discharges

We present a series of sputtering experiments on aluminium samples performe d with an Ar-H, DC-glow discharge at varying Ar-H, gas-composition, driven at a discharge voltage of -300 V and a pressure of 0.2 mbar, in conjunction with measurements of the corresponding ion-energy distributions of the ion s bombarding the discharge cathode (Ar+, Ar2+, ArH+, H-2(+); and H-3(+)). S imilar measurements on gold samples, which have been published, have shown that the Au-sputtering efficiency of an Ar-H-2 glow discharge as a function of gas-composition could be adequately described by the corresponding chan ge in the measured ion-energy distributions, under the assumption of a pure ly physical sputtering process. The experiments presented here show that th is is not the case for aluminium (effectively Al2O3). In this case, a measu red optimal gas-composition of 80% H-2 was found for Al-sputtering, while t he energy-distributions suggest an optimum at 20% (as for gold). This clear ly suggests that hydrogen-enhanced chemical sputtering is taking place. (C) 2001 Elsevier Science B.V. All rights reserved.