In this study we report a systematic investigation of the metastable morpho
logies of Si1-xGex layers obtained by the interplay of kinetics and thermod
ynamics during growth on Si(001). We show that three main growth regimes ca
n be distinguished as a function of the misfit and of the deposited thickne
ss. They correspond to three equilibrium steady state morphologies that con
sist of(105)-facetted hut islands, huts and domes in co-existence, and a bi
modal size distribution of domes, respectively. The shape transitions betwe
en these states are attributed to different levels of relaxation. (C) 2000
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