Nucleation and evolution of Si1-xGex islands on Si(001)

Citation
F. Volpi et al., Nucleation and evolution of Si1-xGex islands on Si(001), THIN SOL FI, 380(1-2), 2000, pp. 46-50
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
380
Issue
1-2
Year of publication
2000
Pages
46 - 50
Database
ISI
SICI code
0040-6090(200012)380:1-2<46:NAEOSI>2.0.ZU;2-Z
Abstract
In this study we report a systematic investigation of the metastable morpho logies of Si1-xGex layers obtained by the interplay of kinetics and thermod ynamics during growth on Si(001). We show that three main growth regimes ca n be distinguished as a function of the misfit and of the deposited thickne ss. They correspond to three equilibrium steady state morphologies that con sist of(105)-facetted hut islands, huts and domes in co-existence, and a bi modal size distribution of domes, respectively. The shape transitions betwe en these states are attributed to different levels of relaxation. (C) 2000 Elsevier Science B.V. All rights reserved.