The growth and structure of Si- and Ge-nanocrystals was investigated using
high resolution X-ray diffraction (HRXRD) and atomic force microscopy (AFM)
. AFRI-images were used to determine the lateral and vertical dimensions of
the nanocrystal. HRXRD measurements show clearly that Si- and Ge-nanocryst
als grow on 6H-SiC(0001) preferentially in two different orientations - [11
1] and [110] - with respect to the surface normal. The growth of Ge-nanocry
stals on Si-rich 6H-SiC(0001) surfaces leads to the formation of Si/Ge-allo
y nanocrystals. Both types of nanocrystals grow coherently with respect to
the substrate. Hence, due to the respective lattice mismatch, the degree of
coherence was found to be much better for Si-nanocrystals. (C) 2000 Elsevi
er Science B.V. All rights reserved.