Si/Ge-nanocrystals on SiC(0001)

Citation
G. Hess et al., Si/Ge-nanocrystals on SiC(0001), THIN SOL FI, 380(1-2), 2000, pp. 86-88
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
380
Issue
1-2
Year of publication
2000
Pages
86 - 88
Database
ISI
SICI code
0040-6090(200012)380:1-2<86:SOS>2.0.ZU;2-4
Abstract
The growth and structure of Si- and Ge-nanocrystals was investigated using high resolution X-ray diffraction (HRXRD) and atomic force microscopy (AFM) . AFRI-images were used to determine the lateral and vertical dimensions of the nanocrystal. HRXRD measurements show clearly that Si- and Ge-nanocryst als grow on 6H-SiC(0001) preferentially in two different orientations - [11 1] and [110] - with respect to the surface normal. The growth of Ge-nanocry stals on Si-rich 6H-SiC(0001) surfaces leads to the formation of Si/Ge-allo y nanocrystals. Both types of nanocrystals grow coherently with respect to the substrate. Hence, due to the respective lattice mismatch, the degree of coherence was found to be much better for Si-nanocrystals. (C) 2000 Elsevi er Science B.V. All rights reserved.