Photoluminescence of carbon-induced Ge islands in silicon

Citation
A. Beyer et al., Photoluminescence of carbon-induced Ge islands in silicon, THIN SOL FI, 380(1-2), 2000, pp. 246-248
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
380
Issue
1-2
Year of publication
2000
Pages
246 - 248
Database
ISI
SICI code
0040-6090(200012)380:1-2<246:POCGII>2.0.ZU;2-C
Abstract
Reducing the size of germanium islands improves their optical properties. T he spatially strong localised holes in the islands are more uncertain in mo mentum and thereby the probability of direct optical transitions is enhance d. Carbon predepositon onto Si has been shown to reduce the size of germani um islands. We have studied such islands grown by molecular beam epitaxy. T he germanium islands show an intense PL-signal, which is typically more tha n one order of magnitude larger in intensity than the PL from silicon-germa nium quantum wells. Reducing the amount of Ge from 3.4 monolayer (ML) to 1. 0 hit results in a PL blueshift from 0.81 to 1.08 eV in conjunction with a narrowing of the PL peak. The blueshift indicates a reduction in the size o f the germanium islands, which was confirmed by TEM. increasing the C cover age from 0.2 to 0.3 ML leads to a red shifted FL. This is attributed to a c hange in the aspect ratio of the islands with the result of an increased ve rtical island height. (C) 2000 EIsevier Science B.V. All rights reserved.