A. De Luis et al., Analysis of a process of advanced oxidation of phenolic wastewater with regard to the removal of aromatic intermediates, AFINIDAD, 57(490), 2000, pp. 439-446
The degradation of phenolic wastewater caused by the action of H2O2/UV syst
em (hydrogen peroxide system with UV radiation) is studied and it is propos
ed the application of a kinetic model based on the action of hydroxyl radic
als generated by the application of UV radiation on the contaminant compoun
ds.
The necessary experimentation to characterize the oxidizing level of the re
action according to the concentration of radical species: (OH)-O-., HO2. an
d O-2(.-) is carried out and it is stated the kinetic constants for the eli
mination of the initial contaminant and immediate aromatic intermediates li
ke the hydroquinone and pyrocatechol.
Degradation kinetic results of the aromatic compounds and H2O2 are compared
with the results stated according to the model for a wide variation pH con
ditions and oxiding concentrations, and a general good fitting within the t
ested conditions is observed.