Citation
A. Subramanian et al., Recovery of activated nickel from residues for electroforming applications, J APPL ELEC, 31(1), 2001, pp. 35-40
Citations number
8
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF APPLIED ELECTROCHEMISTRY
ISSN journal
0021891X
→ ACNP
Volume
31
Issue
1
Year of publication
2001
Pages
35 - 40
Database
ISI
SICI code
0021-891X(200101)31:1<35:ROANFR>2.0.ZU;2-N
Abstract
An electrochemical approach was made to recover the nickel from plating was
tes in the form of activated nickel by incorporating additives such as thio
urea, sodium metabisulfite and sodium thiosulfate in the electrolyte. The a
nodic behaviour of the nickel produced was studied for its suitability in a
Watts nickel and chloride free sulfate baths. It was found that the activa
ted nickel produced with sodium metabisulfite and thiourea additives perfor
ms similarly to commercially available activated nickel anodes.